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Optics for EUV Lithography
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According to the roadmap for optical lithography, known as "Moores Law", structures below 45nm are needed from the year 2010 on. One of the most promising technologies to print these structures is EUV (Extreme Ultra Violet) lithography.
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| 公司名稱 |
臺灣儀器行股份有限公司
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,台灣
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