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Dry Scrubber
Dry Scrubber decomposes PFC generated in a semiconductor
process. PFC is a main cause of global warming and ozone layer
depletion. Since the World Metrological Organization has decided
that PFC be reduced by 20% every year starting 2003, semiconductor
makers have secured this equipment. New Power Plasma’s Dry
Scrubber uses RTT (RF TCP Type) generating plasma at both the
upper and lower levels for the 1st time in the world. Even though it is
expensive microwave type and needs a cover, it is safer and cheaper
than an explosive burn type in large size and heavy weight. It is a
registered Utility model. Taiwan Field Test shows that 99% of CF4
Gas is decomposed. It’s been on a run test for 3 months.
Specifications
1. Reactor Volume : 1300ml(Hard Anodized AL & SUS)
- Isolator : High Purity Ceramic
- Cooling : Water Cooling

2. Plasma Source : Double TCP Type(13.56MHz / 2Kw Max)
3. Process Gas : NF3, C2F6, C3F8, SF6, CF4, CHF3ˇ..
- Total Gas Flow Rate : About 1000SCCM
- Mixing Gas : Ar or O2

Application
- Semiconductor, FPD(TFT-LCD, etc.)

Customer
- Samsung, Hynix & LG, Ju-sung Eng

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 聯絡我們
公司名稱 Ness Display Co.,Ltd.
地址 3F Trust tower, 275-7, Yangjae dong, Seocho gu, Seoul, Korea
郵政編碼 137-130  
電話 82-2-5892573
傳真 82-2-5892560
移動電話  
電子郵箱
網站
聯絡人 Dae-Xiong, Kim / Manager
 
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