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Dry Etcher
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Features
1. Available glass size : 1st Gen ~ 8th Gen.
2. PE, RiE, DCCP Type
3. Cluster type system
Applications
1. Pas SiNx / Gi SiNx Etch
2. a-Si Etch
3. n+ Etch
4.Continuous Dry Etch for 4mask
(SD/n+/a-Si Dry Etch > halftone mask Ashing >
SD metal dry Etch > n+ Dry Etch )
Benefits
1. High throughput
2. High Uptime - Reliable System
3. Easy Maintenance |
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| 公司名稱 |
Innovation for Creative Devices Co.,Ltd.(ICD)
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| 地址
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321-1, Sonae-Ri, Daedeok-Myeon, Anseong-Si, Gyeonggi-Do,Korea
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| 郵政編碼 |
456-833
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| 電話 |
82-31-6783333
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| 傳真 |
82-31-6783301
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| 移動電話 |
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| 電子郵箱 |
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| 網站 |
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| 聯絡人 |
Tae-Yeon Kim / Assistant Manager
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詢盤籃
幫助
ace_suppliers@hotmail.com 
604292613