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Dry Etcher
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Wafer etch solution for 65nm process to provide feature for STI and
Gate process in terms of excellent etch rate control, uniformity, high
selectivity and etch profile
-Targe Wafer;300mm
-Targe Process; STI, Gate
-Poly Etch Rate; > 4,000 Å/min
-Uniformity(WIW); < 3%
-Selectivity; Poly/PR ≥ 3 :1, Poly/Oxide ≥ 200 :1, Poly/Nitride ≥ 10 :1
-Profile Angle; ≥ 89° |
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| 公司名稱 |
SEMES Co., Ltd.
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| 地址
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No.623-5, Upsung-Dong, CheonAn,Chungcheongnam-do,Korea
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| 郵政編碼 |
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| 電話 |
82-41-6208000
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| 傳真 |
82-41-6208008
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| 移動電話 |
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| 電子郵箱 |
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| 網站 |
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| 聯絡人 |
Jung-Wan Kim / Manager
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QQ:  僅買主可瀏覽! 採購商會員登錄 | | MSN: 僅買主可瀏覽! 採購商會員登錄 |
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詢盤籃
幫助
ace_suppliers@hotmail.com 
604292613