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Wet Station
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Latest 300mm wafer cleaning and dry. It is compactly designed as double-layer process structure to maximize productivity. -Partide Performance; Particle (size > 0.09um) SC-1 ≤ 10ea, Rinse ≤ 10ea, FRD ≤ 20ea, Transfer Only ≤ 1 -Etch Rate Control; ≤ 3% -Metallic Contamination; K, Ca, Cr, Fe, Zn ≤ 0.5E+10 Mn, Ni ≤ 0.2E+10 Cu ≤ 1.6E+09 -Throughput(WPH); Transfer ≥ 500 RD ≥ 400 FRD ≥ 250 -Repeatability; MTBF ≥ 500hr, MTBI ≥ 360hr
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| 公司名稱 |
SEMES Co., Ltd.
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| 地址
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No.623-5, Upsung-Dong, CheonAn,Chungcheongnam-do,Korea
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| 郵政編碼 |
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| 電話 |
82-41-6208000
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| 傳真 |
82-41-6208008
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| 移動電話 |
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| 電子郵箱 |

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| 網站 |
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| 聯絡人 |
Jung-Wan Kim / Manager
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QQ: 僅買主可瀏覽! 採購商會員登錄 | MSN: 僅買主可瀏覽! 採購商會員登錄 |
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