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Dry Etcher
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Etch Layer:SinX(5000A/min)
a-Si(2000A/min),n+a-Si
P.R strip(10000A/min),
Uniformity: +-1 0%
▶ High etch rate attained through uniform plasma
▶ density
▶ Excellent etch uniformity attained through optimal
▶ electrode shape design
▶ Easy maintenance due to simple chamber
▶ structure
▶ Improved production throughput due to application
▶ of independent transfer systems
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| 公司名稱 |
ADP Engineering Co., Ltd.
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| 地址
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333-5 Sangdaewon-Dong, Jungwon-Gu, Seongnam-City, Gyeonggi-Do,Korea
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| 郵政編碼 |
462-120
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| 電話 |
82-31-7781114
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| 傳真 |
82-31-7781199
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| 移動電話 |
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| 電子郵箱 |
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| 網站 |
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| 聯絡人 |
Sang-Wook, Park / Manager
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詢盤籃
幫助
ace_suppliers@hotmail.com 
604292613