|
|
|
|
| |
PD-220N
(Model PD-220N)
|
|
SAMCOs PD-220N is highly flexible and supports a wide range of
applications, from cutting edge R&D to low volume manufacturing.
The PD-220N is a unique Plasma-Enhanced Chemical Vapor
Deposition (PECVD) system designed for the deposition of silicon-
based thin films (SiO2, Si3N4, SiOxNy, a-Si:H).
The system offers all of the standard features for PECVD in a very
compact footprint. Films with superior thickness and refractive index
uniformity can be deposited over a 230mm diameter area, with
excellent batch-to-batch repeatability. A computerized touch-panel
provides a user-friendly interface for parameter control and recipe
storage.
The SAMCO PD-220N is ideal for depositing thin film for research
and development as well as pilot production applications.
|
|
|
|
|
|
| 公司名稱 |
Samco Inc.
|
| 地址
|
17F-8 Empire Commercial Bldg. 295 Kuang-Fu Rd., Sec. 2, Hsinchu 300, Taiwan, R.O.C.,台灣
|
| 郵政編碼 |
|
| 電話 |
886-3-5165100
|
| 傳真 |
886-3-5165101
|
| 移動電話 |
|
| 電子郵箱 |
|
| 網站 |
|
| 聯絡人 |
/
|
|
|
|
|
詢盤籃
幫助
ace_suppliers@hotmail.com 
604292613