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Batch Coafing System
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System Capabilities:
FCVA Deposition
Sputtering Deposition
Ion Beam Etching / Pre-Cleaning
Type of Coatings:
ta-C
Metal / Alloys
Oxides
Nitrides
Silicon(Sputtering only)
System Features:
Rotary Substrate Holder
(Single Wafer or Quartet-Wafer Capability)
Substrate Rotation
Large Coating Area Up to Ø250mm
Real Time Process Monitoring
User-Friendly Interface Preview Control Interface
User Defined Coating Recipe Preview Control Interface
Data Log for Parameters and Events Preview Control Interface
Multi-Source Process Chamber
- FCVA Source
- Ion Beam Source (optional)
- Sputtering Source (optional)
Dynamic Real Time Compensation
- Excellent process repeatability
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| 公司名稱 |
Nanofilm Technologies International Pte Ltd
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| 地址
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阿逸拉惹工業區,阿逸拉惹彎28號02-02/03/04,Singapore
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| 郵政編碼 |
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| 電話 |
65-6872-6890
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| 傳真 |
65-6872-5093
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| 移動電話 |
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| 電子郵箱 |
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| 網站 |
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| 聯絡人 |
Sales /
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詢盤籃
幫助
ace_suppliers@hotmail.com 
604292613