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300mm photoresist dry strip
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The Gamma Express 300mm photoresist dry strip system offers both front-end-of-line (FEOL) and back-end-of-line (BEOL) resist removal for 65nm and 45nm processing. The system is compatible with advanced silicide and ultralow-k films, and supports conventional bulk strip, high-dose implant strip (HDIS), and C4 packaging requirements. The company says throughput is 300wph for bulk strip applications, and 150wph for HDIS. Novellus Systems Inc., |
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| 公司名稱 |
microlithography world
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| 地址
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VIRGINIS.(US)Nashua98 Spit Brook Road Nashua, NH 03062-5737
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| 郵政編碼 |
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| 電話 |
603-8910123
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| 傳真 |
603-8910597
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