Rapid Thermal Processing System(RTA150H) - CENTROTHERM GMBH & CO.KG 製造廠, 製造商,供應商, 產品, 製造

Rapid Thermal Processing System
(RTA150H)

This compact highly efficient semiautomatic tool supports the
multiple process requirements needed for pilot line production. The
system offers the advantage of multiple wafer processing backed by
process repeatability and lowest CoO.

The patented circular lamp heating system uniquely combines
adaptive radial heating and uniformity control. High precision
temperature control is performed by direct thermocouple control. In
conjunction, the proprietary pyrometer temperature measurement
and control system is also available.

The atmospheric stand-alone system is equipped with a quartz tube
reactor chamber, and can be configured for processing Si or
compound semiconductor substrates. Process temperatures range
from 300 to 1000 .

Centrotherm/Nymtech design systems for high performance,
integrated small footprint, low cost of ownership while providing
process flexibility required to support multiple process requirements.
This semiautomatic RTP package provides all the features for pilot
line production with safe and reliable thermal process performance.

Features and Benefits
Compact stand-alone, atmospheric system
High flexibility for 2" to 6" wafer sizes for GaN/GaAs/Si substrates
Enhanced throughput by multiple wafer processing
Up to 120 /sec ramp rate for flash processing
Unique 8 zone uniformity control for superior uniformity
User-friendly programming of multiple step cycles
Long life lamps ensure high uptime and lowest CoO