300 mm Production Diffusion Furnace<br>(E-3000) - B2B貿易平臺

300 mm Production Diffusion Furnace
(E-3000)

The E-3000 Production tool will satisfy silicon production capacity
needs for both high performance device fabs as well as smaller 300
mm silicon development users. Base configurations include
centrotherm precision 300 mm heating element capable of up to
1200 process temperatures, in up to (3) three stacked reactors.
The E-3000 offers high reliability with the production proven features
typical of centrotherm抯 horizontal furnace platform. The E-3000
furnace package includes a new Central Machine Interface (CMI) for
easy Windows based multi-tube controls access.

Features
Cost efficient Diffusion, Oxidation, and Annealing processes.
Production capability of up to 65 wafers (300 mm) per tube cycle.
Clean wafer boat loading for processing of 300 mm diameter wafers
with up to (3) three process selectable reactors.
The E-3000 is process ready with either quartz or silicon carbide
(SIC) reactors and boats/ cantilevers with non-contact or soft-landing
wafer loading for process temperatures up to 1200.
Wafers are processed at high temperatures without generation of
any stacking faults, dislocations, slip lines or other large crystal
defects.

Benefits
Softlanding Transport System
Annealing and Oxidation Processes
Vertical Laminar Flow (Option)
Thermal Flat Zone: 700 mm (28@ 65 x 300 mm Wafers
Temperature: (600 1200) 0.5