Planetary Reactor

AIXTRON's mass production systems are based on the planetary
concept (Planetary Reactor), which was developed by Philips and is
under exclusive license to AIXTRON. They are able to incorporate
substrates from 2" to 10" in size (see Overview), and consist of
quartz and easily replaceable graphite components, with a water-
cooled stainless steel housing.

All AIXTRON systems are fitted with horizontal laminar flow reactors.
The laminar flow principle guarantees extremely precise
heterojunctions and unequalled control of deposition rates at the
monolayer level. The combination of this principle with AIXTRON's
unique multiple substrate carrier rotation, known as Gas Foil
Rotation (GFR), ensures excellent deposition homogeneity
regarding layer width, composition and doping. In addition, the
special reactor inlet valve, which allows the separation of certain
gases, ensures a uniform outward radial flow and optimum
distribution adjustment.

The reactors are heated via infrared (850°C) or inductively (1200°
C to 1700°C in the case of silicon carbide) and can be equipped
with a wide range of in-situ sensors, including the EpiRAS exclusive
to AIXTRON reactors.