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IPS Ltd. (Integrated Process Systems)
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In 1996, IPS was established on the commitment to contribute to the growth of the semiconductor industry by developing the Fab process equipment technology, which was stagnant at that time in Korea.
Our ceaseless endeavors poured to R & D came to fruition with the success in developing the dry etcher for Fab process, which had been fully imported until then, and in supplying it to the mass production line of a notable semiconductor maker in Korea. Hereby, IPS began to substantially lead the localization of the semiconductor equipment, substituting imports .IPS also succeeded in developing cutting-edge technologies for ALD and introduced its newly developed ALD system to semiconductor production lines in cooperation with a leading semiconductor maker, thus making it possible to release a mass-production-scale ALD system for the first time in the world. IPS ALD system is currently used by prominent semiconductor makers at home and abroad, being appreciated for its stable performance and high-quality ALD layer that meet the requirements for mass production.
Starting with the successful introduction of ALD to 130-nanometer element mass production, IPS is expanding its ALD applications to the 90 or less-nanometer element process, which is expected to lead our future sales growth as a major business area of IPS when analyzed by the progress status of research and development. We, at IPS, will continue every effort to be recognized as a leading company representing Korea ’ s semiconductor and LCD equipment industry. To realize this vision, IPS will accelerate its sales growth through diversifying the business into more marketable areas, such as metal barrier ALD/CVD and general-purpose ALD and dry etching, while reinforcing the current business related to insulating film ALD and dry etcher for semiconductor Fab lines.
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| 公司名稱 |
IPS Ltd. (Integrated Process Systems)
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| 地址
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33, Jije-dong, Pyeonglaek-cith, Gyeonggi-do, Korea,台灣
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| 電話 |
-031-6592000
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| 傳真 |
031655711145
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