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We are a high-tech venture company promoted by engineers at the forefront of development in the semiconductor industry. The semiconductor industory has kept growing, and 300mm or 0.1 micron tips will soon be manufactured. During this exciting time, we have developed original plasma technologies, and applied them to our equipments. Our main expertise is in plasma applications. We provide etching equipment by oxide film and low-k films for 300mm/8 inches silicon wafers. We also provide ashing equipment for 300mm/8 inches silicon wafers. We also provide multipurpose etching equipment for Polyamide film, LCD devices and so on.
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產品服務: |
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貿易類型: |
制造商
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OEM 服務: |
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採購或供應商: |
供應商 |
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市場位置: |
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年銷售額 (美元) : |
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成立年份: |
1900
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法人代表/CEO: |
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| 公司名稱 |
FOI Corporation
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| 地址
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新竹市公道五路2段176號3樓,台灣
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| 郵政編碼 |
300
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| 電話 |
886-3-5725336
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| 傳真 |
886-3-5725356
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| 聯絡人 |
Mr. /
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